Skip to main content

Metrology for trace water in ultra-pure process gases

Trace water is the single largest matrix contaminant in ultra-high purity (UHP) process gases. Even though the manufacturing of UHP gases serves many of the key technology areas, such as high-value semiconductor manufacturing, trace water measurements are still lacking measurement traceability in the relevant ranges and matrix gases.

Funding entity:

Principal Investigator:

José Juan Segovia Puras
Professor of Thermodynamics

Mª Carmen Martín González
Professor of Thermodynamics